Research on characteristics of materials and devices related with semiconductor, display and biointerface.
Journal Articles
(2023)
Change in Electrical/Mechanical Properties of Plasma Polymerized Low Dielectric Constant Films after Etching in CF4/O2 Plasma for Semiconductor Multilevel Interconnects.
MATERIALS.
16,
13
(2023)
Inner surface modification of polyurethane ureteral stents using plasma-enhanced chemical vapor deposition to improve the resistance to encrustation in a pig model.
INVESTIGATIVE AND CLINICAL UROLOGY.
64,
2
(2022)
Reduction time effect on the dielectric characteristics of reduced-graphene-oxide--encapsulated barium titanate powder fillers.
CARBON.
199,
1
(2022)
Etching characteristics of low-k SiCOH thin films under fluorocarbon-based plasmas.
Vacuum.
202,
1
(2022)
Enhancement of dielectric performance of encapsulation in barium titanate oxide using size-controlled reduced graphene oxide.
RSC ADVANCES.
12,
26
(2022)
Inner surface modification of ureteral stent polyurethane tubes based by plasma-enhanced chemical vapor deposition to reduce encrustation and biofilm formation.
BIOFOULING.
38,
5
(2021)
Plasma Polymerized SiCOH Films from Octamethylcyclotetrasiloxane by Dual Radio Frequency Inductively Coupled Plasma Chemical Vapor Deposition System.
Journal of Nanoscience and Nanotechnology.
21,
8
(2021)
Study on Effects of Carrier Gas Flow Rate on Properties of Low Dielectric Constant Film Deposited by Plasma Enhanced Chemical Vapor Deposition Using the Octamethylcyclotetrasiloxane Precursor.
Journal of Nanoscience and Nanotechnology.
21,
8
(2021)
Enhanced culturing of adipose derived mesenchymal stem cells on surface modified polystyrene Petri dishes fabricated by plasma enhanced chemical vapor deposition system.
JOURNAL OF BIOMEDICAL MATERIALS RESEARCH PART B-APPLIED BIOMATERIALS.
110,
2
(2021)
Ultralow dielectric constant SiCOH films by plasma enhanced chemical vapor deposition of decamethylcyclopentasiloxane and tetrakis(trimethylsilyloxy)silane precursors.
THIN SOLID FILMS.
727,
1
(2021)
Characterization of Flexible Low-k Dielectric SiCOH Films Prepared by Plasma-Enhanced Chemical Vapor Deposition of Tetrakis(trimethylsilyloxy)Silane Precursor.
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY.
21,
4
(2020)
One-step fabrication method of non-fouling amine-functionalized polyethylene glycol thin film using a single precursor through plasma-enhanced chemical vapor deposition.
SURFACE & COATINGS TECHNOLOGY.
403,
(2020)
Dielectric characteristics of graphene-encapsulated barium titanate polymer composites.
MATERIALS CHEMISTRY AND PHYSICS.
255,
(2020)
Dielectric characteristics of graphene-encapsulated barium titanate polymer composites..
MATERIALS CHEMISTRY AND PHYSICS.
255,
-
(2020)
Characterization of Bilayer Organic Solar Cells with Carbon Nanotubes Using Impedance Analysis.
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY.
20,
11
(2020)
Effects of He/H(2)( )Plasma Treatment on Properties o f SiCOH Films Deposited with the 1,1 1,3,5,7,7,7-Octamethyl-3,5-Bis(Trimethylsiloxy) Tetrasiloxane Precursor.
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY.
20,
11
(2020)
Surface modification of polystyrene Petri dishes by plasma polymerized 4,7,10-trioxa-1,13-tridecanediamine for enhanced culturing and migration of bovine aortic endothelial cells.
BIOFOULING.
36,
7
(2020)
Effect of plasma power on properties of hydrogenated amorphous silicon carbide hardmask films deposited by PECVD.
VACUUM.
174,
(2020)
Low-k SiCOH Films Deposited with a Single Precursor 1,1,1,3,5,7,7,7 Octamethyl-3,5-Bis(trimethylsiloxy) Tetrasiloxane by Plasma Enhanced Chemical Vapor Deposition.
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY.
20,
4
Publications
(2002)
대학물리학.
북스힐.
Co-author
(2001)
일반물리학실험.
성대 출판부.
Co-author
Patent/Intellectual Property
줄기세포 배양용 기판의 제조방법.
10-2017-0079013.
20190610.
KOREA, REPUBLIC OF
탄소, 산소, 및 금속을 포함하는 금속탄화산화물 박막 및 그의 제조방법.
10-2015-0159154.
20180109.
KOREA, REPUBLIC OF
산소 및/또는 수분 차단용 다층 박막.
10-2015-0023297.
20170821.
KOREA, REPUBLIC OF
Method of Manufacturing Patterned Substrate for Culturing Cells, Patterned Substrate for Culturing Cells, Patterning Method of Culturing Cells, and Patterned Cell Chip.
14/634,190.
20170228.
UNITED STATES
A TUBE WITH MODIFIED INNER WALL SURFACE USING PLASMA AND A PREPARATION METHOD THEREOF.
US14/167,251.
20170223.
UNITED STATES
A POROUS FILM WITH HIGH HARDNESS AND A LOW DIELECTRIC CONSTANT AND PREPARATION METHOD THEREOF.
14/825,823.
20160621.
UNITED STATES
유기전자소자용 폴리머/무기 다층 박막 봉지.
10-2014-0017311.
20150716.
KOREA, REPUBLIC OF
고강도 저유전 플라즈마 중합체 박막 및 그 제조방법.
10-2013-0098177.
20150323.
KOREA, REPUBLIC OF
플라즈마를 이용하여 내부표면이 개질된 튜브 및 이의 제조방법.
10-2013-0024725.
20150112.
KOREA, REPUBLIC OF
패턴화된 세포배양용 기판의 제조방법, 패턴화된 세포 배양용 기판 및 세포칩.
10-2013-0025350.
20141111.
KOREA, REPUBLIC OF
유기전자소자용 폴리머/무기 다층 박막 봉지.
10-2013-0122884.
20140418.
KOREA, REPUBLIC OF
저유전 플라즈마 중합체 박막 및 그 제조방법.
200810182570.1.
20120509.
CHINA
저유전 플라즈마 중합체 박막 및 그 제조 방법.
EP08170636.
20120502.
EU
세포 고정화용 기판의 제조방법, 세포 고정화용 기판, 세포의 고정 방법, 및 세포칩 (METHOD OF MANUFACTURING SUBSTRATE FOR FIXING CELLS, SUBSTRATE FOR FIXING CELLS, METHOD OF FIXING CELLS, AND CELL CHIP).
10-2010-7021614.
20120326.
KOREA, REPUBLIC OF
패턴화된 세포 고정화용 기판의 제조방법, 패턴화된 세포 고정화용 기판, 세포의 패턴화된 배양 방법, 및 패턴화된 세포칩.
10-2009-0082152.
20120314.
KOREA, REPUBLIC OF
유기태양전지 및 그 제조방법.
10-2009-0011605.
20110701.
KOREA, REPUBLIC OF
저유전 플라즈마 중합체 박막 및 그 제조 방법 (PLASMA POLYMERIZED THIN FILM AND MANUFACTURING METHOD THEREOF).
2010-0005202.
20101005.
KOREA, REPUBLIC OF
플라즈마를 이용한 단백질 칩 기판의 제조방법 및 이로부터 제조된 단백질 칩 기판.
11/616,483.
20100831.
UNITED STATES
플라즈마를 이용한 단백질칩 기판의 제조방법 및 이로부터 제조된 단백질칩 기판.
2006-353470.
20100611.
JAPAN
저유전 플라즈마 중합체 박막 및 그 제조 방법.
2007-0126331.
20100531.
KOREA, REPUBLIC OF
Conference Paper
(2023)
Characteristics of Carbon-rich SiCN Films Used as Dielectric Cu Diffusion
Barrier Deposited by PECVD Using The 1-(Trimethylsilyl)pyrrolidine
Precursor for Semiconductor Multilevel Metallization.
한국반도체학회.
KOREA, REPUBLIC OF
(2022)
Inner surface modfication of polyurethane ureteral stent using plsma-enhanced chemical vapor deposition for impoved resistance to encrustation in a pig model.
제29차 대한비뇨내시경로봇학회.
KOREA, REPUBLIC OF
(2022)
Cu diffusion Barrier Characteristics of Carbon Rich SiCN Films Deposited by PECVD Using the 1-(Trimethylsilyl)Pyrrolidine Precursor for Semiconductor Multilevel Metallization.
2022 ISPSA.
KOREA, REPUBLIC OF
(2021)
CF4/O2 plasma etching properties of low dielectric constant films deposited by plasma enhanced chemical vapor deposition using the tetrakis(trimethylsilyloxy)silane precursor..
ICMAP 2020.
KOREA, REPUBLIC OF
(2020)
Effect of Low-Frequency Plasma on Polymerized SiCOH Low-kFilms in 13.56 MHz and 370 kHz Dual-Frequency Inductively Coupled PlasmaSystemUsing the Octamethylcyclotetrasiloxane Precursor.
The 27th Korean Conference on Semiconductors.
KOREA, REPUBLIC OF
(2020)
Effects of Carrier Gas Flow Rate on Properties of SiCOH Low Dielectric Constant Films in Plasma Enhanced Chemical Vapor Deposition Process Using the Octamethylcyclotetrasiloxane Precursor.
The 27th Korean Conference on Semiconductors.
KOREA, REPUBLIC OF
(2020)
Characterization of reduced graphene oxide by controlling the reduction time and its application to BaTiO3 encapsulation in dielectric behavior.
The 6th MUJU INTERNATIONAL Winter School.
KOREA, REPUBLIC OF
(2020)
Dielectric behavior of cyanoethyl pullulan polymer composite composed of reduced graphene encapsulated ferroelectric barium titanate.
The 6th MUJU INTERNATIONAL Winter School.
KOREA, REPUBLIC OF
(2020)
Dielectric performance comparison between encapsulation and mixing of reduced graphene oxide with ferroelectric BaTiO3 and a polymer.
The 6th MUJU INTERNATIONAL Winter School.
KOREA, REPUBLIC OF
(2019)
Fabrication and Characterizations of Amine-functionalized PEG Thin Films by Using Plasma-Enhanced Chemical Vapor Deposition.
The 22nd International Conference on Secondary Ion Mass Spectrometry.
JAPAN
(2019)
Effective Lifetime of P3HT/PCBM Bi-layer Organic Solar Cells with Carbon Nanotubes by Impedance Analysis.
International Forum on Functional Materials 2019.
KOREA, REPUBLIC OF
(2019)
Effects of He/H2 plasma treatment on properties of SiCOH films deposited with the 1,1,1,3,5,7,7,7-octamethyl-3,5-bis(trimethylsiloxy)tertrasiloxane precursor.
International Forum on Functional Materials.
KOREA, REPUBLIC OF
(2018)
Low dielectric constant plasma polymerized SiCOH film deposited from tetrakis(trimethylsilyoxy)silane as a flexible insulator.
The 7th International Conference on Microelecronics and Plasma Technology.
KOREA, REPUBLIC OF
(2018)
Plasma copolymerization of ultra-low dielectric constant SiCOH films using octamethylcyclotetrasiloxane and tetraethylorthosilicate precursors.
The 7th International Conference on Microelecronics and Plasma Technology.
KOREA, REPUBLIC OF
(2017)
초저유전상수 플라즈마 중합된 테트라키스(트리메틸실릴옥시)실란 박막.
반도체 디스플레이 공정, 장비 및 소재 신기술 동향.
KOREA, REPUBLIC OF
(2017)
Fabrication and characterization of amine functionalized plasma polymerized PEG film on 3D beads by using modified PE-CVD system.
NANO KOREA 2017.
KOREA, REPUBLIC OF
(2017)
Plasma surface modification for the enhanced adhesiveness of human umbilical vein endothelial cells on polystyrene petri dishes.
2017 International Forum on Functional Materials (IFFM2017).
KOREA, REPUBLIC OF
(2017)
Characteristics of deposition and etch selectivity of TiOx films deposited by PECVD from titanium isopropoxide precursor.
2017 International Forum on Functional Materials (IFFM2017).
KOREA, REPUBLIC OF
(2017)
Flexibilities of low-k films deposited by PECVD with the tetrakis(trimethylsilyloxy)silane precursor.
2017 International Forum on Functional Materials (IFFM2017).
KOREA, REPUBLIC OF
(2017)
Electrical Properties of Low-k SiCOH Films Deposited with the Phenyltrimethoxysilane Single Precursor.
2017 MRS spring meeting & exhibit.
UNITED STATES
